Title:
PRODUCTION METHOD FOR EXPOSURE SYSTEM, LIGHT SOURCE UNIT, EXP0SRUE SYSTEM, EXPOSURE METHOD AND ADJUSTMENT METHOD FOR EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2004/049409
Kind Code:
A1
Abstract:
A method of producing an exposure system which illuminates a mask by using an illuminating optical system including a condensing optical system to transfer the mask’s pattern onto a photosensitive substrate, the method comprising the solid light source disposing step (S11) of disposing a plurality of solid light sources in the front-side focal point position of the condensing optical system or in a position optically conjugate to that position, and the adjusting steps (S12-S16) of setting the characteristics of the illuminating optical system, that have been set to a first condition suitable for a light source different from the plurality of solid light sources, to those in a second condition to be made suitable by disposing the solid light sources.
More Like This:
Inventors:
TAKENAKA SHUJI (JP)
Application Number:
PCT/JP2003/014972
Publication Date:
June 10, 2004
Filing Date:
November 25, 2003
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
TAKENAKA SHUJI (JP)
TAKENAKA SHUJI (JP)
International Classes:
G02B19/00; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| WO2001020733A1 | 2001-03-22 | |||
| WO1999046835A1 | 1999-09-16 |
Foreign References:
| US6324203B1 | 2001-11-27 | |||
| JP2001352116A | 2001-12-21 |
Attorney, Agent or Firm:
Fujimoto, Yoshihiro (5F 6-1, Uchikanda 3-chom, Chiyoda-ku Tokyo, JP)
Download PDF:
Previous Patent: PLATE THROUGH MASK FOR GENERATING ALIGNMENT MARKS OF MIM CAPACITORS
Next Patent: EXPOSURE APPARATUS AND EXPOSURE METHOD
Next Patent: EXPOSURE APPARATUS AND EXPOSURE METHOD