Title:
EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD, AND TEMPERATURE STABILIZATION FLOW PASSAGE DEVICE
Document Type and Number:
WIPO Patent Application WO/2002/101804
Kind Code:
A1
Abstract:
An exposure device (10), comprising temperature stabilization flow passage devices (100A, 100B) forming a part of the flow passages for the gas supplied by a feeder (52, 56, 58, 62, 64) and, after suppressing a variation in temperature of the gas flowing thereinto, allowing the gas to flow out into a space inside an exposure chamber (16), for example, into a moving space of a wafer stage (WST) inside a main column (34) through jetting units (102A, 102B), whereby the gas with suppressed temperature variation can be supplied into the exposure chamber and, accordingly, the controllability of temperature in the exposure chamber can be increased by suppressing a variation in temperature of the gas in at least a part of the inside of the exposure chamber.
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Inventors:
KATO YUZO (JP)
Application Number:
PCT/JP2002/005763
Publication Date:
December 19, 2002
Filing Date:
June 11, 2002
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
KATO YUZO (JP)
KATO YUZO (JP)
International Classes:
G03F7/20; H01L21/00; (IPC1-7): H01L21/027; G03F7/20
Foreign References:
| EP0838728A2 | 1998-04-29 | |||
| JPS6418002A | 1989-01-20 | |||
| JPH1126363A | 1999-01-29 | |||
| JP2000243684A | 2000-09-08 |
Attorney, Agent or Firm:
Tateishi, Atsuji (4-20 Haramachida 5-chom, Machida-shi Tokyo, JP)
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