Title:
EXPOSURE DEVICE AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2019/021858
Kind Code:
A1
Abstract:
An exposure device 100 comprises: a main illumination light source 2 for producing first exposure light L1A, L1B; a field stop 3 wherein a plurality of openings is staggered around a first axis line in plan view; a plurality of first projection optical systems for projecting each light image based on the first exposure light L1A, L1B ontoan exposed object 6; an additional illumination light source 12 for exposure, arranged adjacent to the main illumination light source 2 in a first direction, for producing second exposure light L2A, L2B used to irradiate a photomask 1; and a correction exposure unit. A composite aperture area rc and a single aperture area rs are formed alternately in a second direction in the stop member. The correction exposure unit irradiates the exposed object 6 with the second exposure light L1
2A, L1
2B within a light correction area.
Inventors:
OKUMURA AKIHITO (JP)
MOTODA YOSHINORI (JP)
MIYAJI HIROAKI (JP)
MOTODA YOSHINORI (JP)
MIYAJI HIROAKI (JP)
Application Number:
PCT/JP2018/026490
Publication Date:
January 31, 2019
Filing Date:
July 13, 2018
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
G03F7/20; G02B19/00
Foreign References:
| JP2016001258A | 2016-01-07 | |||
| JP2000331909A | 2000-11-30 | |||
| JP2002258489A | 2002-09-11 | |||
| JP2001297975A | 2001-10-26 |
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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