Title:
EXPOSURE DEVICE AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2020/202900
Kind Code:
A1
Abstract:
According to the present invention, an exposure surface of a substrate and an imaging surface of an exposure part are matched while maintaining flatness of the substrate, and a flaw occurring on the exposure surface of the substrate is prevented. This exposure device for exposing a substrate is provided with: a substrate holder that has a holding surface for suctions and holds the substrate; a driving mechanism that moves the substrate holder in a direction perpendicular to the holding surface; and a substrate pressing member that is disposed so as not to be displaced in the direction perpendicular to the holding surface and that abuts the substrate at a position avoiding the exposure region of the substrate when the substrate held by the substrate holder pressed against the substrate pressing member by the driving mechanism.
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Inventors:
TAKAGI TOSHIHIRO (JP)
KOBAYASHI KAZUHIRO (JP)
KOBAYASHI KAZUHIRO (JP)
Application Number:
PCT/JP2020/007338
Publication Date:
October 08, 2020
Filing Date:
February 25, 2020
Export Citation:
Assignee:
SANEI GIKEN CO LTD (JP)
International Classes:
G03F7/20
Foreign References:
| JPS63154352A | 1988-06-27 | |||
| JP2006248651A | 2006-09-21 | |||
| JPS6321649A | 1988-01-29 | |||
| JP2011081317A | 2011-04-21 | |||
| JP2006192520A | 2006-07-27 |
Attorney, Agent or Firm:
YAMAMOTO, Osamu et al. (JP)
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