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Patent Searching and Data


Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/008731
Kind Code:
A1
Abstract:
In the present invention, the following are provided: a laser light source that can change the wavelength of emitted laser light; a mask on which is formed a pattern for generating diffraction light by using the projection of the laser light; and a control unit that controls the wavelength of the laser light, which was emitted by the laser light source, in accordance with the distance between the mask and the substrate. The laser light emitted by the laser light source is projected onto the mask, and on the surface of the substrate, proximity exposure may be carried out.

Inventors:
ONOSE TAKASHI (JP)
KAKIZAKI KOUJI (JP)
WAKABAYASHI OSAMU (JP)
SUZUKI AKIYOSHI (JP)
Application Number:
PCT/JP2014/068722
Publication Date:
January 22, 2015
Filing Date:
July 14, 2014
Export Citation:
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Assignee:
GIGAPHOTON INC (JP)
International Classes:
H01L21/027
Domestic Patent References:
WO2012049638A12012-04-19
Foreign References:
JP2007286411A2007-11-01
JP2013051292A2013-03-14
JP2013016696A2013-01-24
JP2008517472A2008-05-22
JP2004069398A2004-03-04
JPH06188176A1994-07-08
Attorney, Agent or Firm:
HOSAKA Nobuhisa et al. (JP)
Hosaka Prolongation of life (JP)
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