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Patent Searching and Data


Title:
FERROMAGNETIC MATERIAL SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2020/053973
Kind Code:
A1
Abstract:
Provided is a Co-Pt-based ferromagnetic material sputtering target which has a high magnetic leakage flux and can be prevented from the formation of particles during sputtering. A ferromagnetic material sputtering target which contains metal Co and metal Pt in a total amount of 70 mol% or more at a Co:Pt molar ratio of X:(100-X) (59 ≤ X < 100) and also contains metal Cr in an amount of 0 to 20 mol% inclusive, and which has a Co particle phase containing metal Co in an amount of 90 mol% or more and having an average particle diameter of 30 to 300 μm and a Co-Pt alloy particle phase containing metal Co and metal Pt in a total amount of 70 mol% or more at a Co:Pt molar ratio of Y:(100-Y) (20 ≤ Y ≤ 60.5) and having an average particle diameter of 7 μm or less.

Inventors:
OGINO SHIN-ICHI (JP)
Application Number:
PCT/JP2018/033698
Publication Date:
March 19, 2020
Filing Date:
September 11, 2018
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22C1/04
Foreign References:
JP2011174174A2011-09-08
JP2016056392A2016-04-21
JP2010090412A2010-04-22
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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