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Title:
SPUTTERING TARGET, MAGNETIC FILM, AND METHOD FOR MANUFACTURING MAGNETIC FILM
Document Type and Number:
WIPO Patent Application WO/2020/053972
Kind Code:
A1
Abstract:
A sputtering target according to the present invention contains, in terms of an atomic ratio, 1 at.% or more of Zn wherein each of some or all of Zn atoms forms a Zn-Ti-O composite oxide and/or a Zn-Si-O composite oxide, also contains, in terms of an atomic ratio, 45 at.% or less of Pt, with the remainder made up by Co and unavoidable impurities.

Inventors:
MASUDA MANAMI (JP)
SHIMIZU MASAYOSHI (JP)
SHIMOJYUKU AKIRA (JP)
Application Number:
PCT/JP2018/033697
Publication Date:
March 19, 2020
Filing Date:
September 11, 2018
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34
Domestic Patent References:
WO2017085933A12017-05-26
WO2012077665A12012-06-14
Foreign References:
JP2013224259A2013-10-31
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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