Title:
FILM FORMING COMPOSITION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY, METHOD FOR PRODUCING LOWER LAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2020/145406
Kind Code:
A1
Abstract:
The present invention provides a film forming composition containing a polycyclic polyphenol resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by formula (1A) and formula (1B), wherein the repeating units of the polycyclic polyphenol resin are linked by direct bonding between aromatic rings. (In formula (1A), X represents an oxygen atom, a sulfur atom, a single bond, or is not crosslinked, Y is a C1-60 2n-valent group or a single bond; here, when X is not crosslinked, Y is the 2n-valent group. Also, in formula (1B), A represents a benzene ring or a fused ring. Furthermore, in formula (1A) and formula (1B), R0 each independently is an optionally substituted C1-40 alkyl group, an optionally substituted C6-40 aryl group, an optionally substituted C2-40 alkenyl group, a C2-40 alkynyl group, an optionally substituted C1-40 alkoxy group, a halogen atom, a thiol group, or a hydroxyl group; here, at least one R0 is a hydroxyl group; m each independently is an integer of 1-9. n is an integer of 1-4, and p each independently is an integer of 0-3.)
Inventors:
OMATSU TADASHI (JP)
YAMAMOTO HIROAKI (JP)
HORIUCHI JUNYA (JP)
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)
YAMAMOTO HIROAKI (JP)
HORIUCHI JUNYA (JP)
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2020/000764
Publication Date:
July 16, 2020
Filing Date:
January 10, 2020
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C08G61/12; G03F7/023; G03F7/038; G03F7/039; G03F7/11; G03F7/20; H01L21/027; H01L21/28
Foreign References:
| JP2008065081A | 2008-03-21 | |||
| JP2016206676A | 2016-12-08 | |||
| JP2010271654A | 2010-12-02 | |||
| JP2003183362A | 2003-07-03 | |||
| JP2020027302A | 2020-02-20 |
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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