Title:
FLOW RATE CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/049292
Kind Code:
A1
Abstract:
Provided is a flow rate control device with which it is possible to curb manufacturing costs and drastically reduce the burden of setup and maintenance. This flow rate control device (11) is provided with: a flow rate control valve (21) disposed in a flow channel (13); a flow rate measurement unit (41) which measures the flow rate of a fluid flowing through the flow channel (13); and a control unit (61) which controls the opening degree of the flow rate control valve (21) on the basis of a measurement result of the flow rate measurement unit (41). The flow rate control device has an insufficient pressure detection function for detecting which determines insufficient pressure when a limit sensor (valve opening detection sensor) (246) for detecting the opening degree of the flow rate control valve (21) detects a fully open valve. By this configuration, the present invention is capable of warning of insufficient pressure at an early stage before a defect occurs due to a drop in flow rate.
Inventors:
KAWAMOTO TAKAHIRO (JP)
SHIMADA TAKUO (JP)
TOBIMATSU SHINJI (JP)
SEKINE TETSUAKI (JP)
SHIMADA TAKUO (JP)
TOBIMATSU SHINJI (JP)
SEKINE TETSUAKI (JP)
Application Number:
PCT/JP2017/032376
Publication Date:
March 14, 2019
Filing Date:
September 07, 2017
Export Citation:
Assignee:
TOFLO CORP (JP)
International Classes:
F16K31/06; F16K31/04; G05D7/06
Foreign References:
| JPH11296233A | 1999-10-29 | |||
| US20160069772A1 | 2016-03-10 | |||
| JP2017174428A | 2017-09-28 |
Attorney, Agent or Firm:
KAYAHARA Yuji (JP)
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