Title:
FLUID DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/180870
Kind Code:
A1
Abstract:
This fluid device is provided with a pair of substrates including a substrate in which a groove for forming a flow path is provided, and a treatment substrate held between the aforementioned pair of substrates and provided with a treatment section for treating a solution. In the treatment substrate, a through-hole that penetrates in the plate thickness direction is provided; on at least one of the pair of substrates, a protruding section is provided which protrudes towards the other of the pair of substrates and which is inserted into the through-hole; and, at the tip of the protruding section, a welding section for welding the pair of substrates together is provided.
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Inventors:
ISHIZAWA NAOYA (JP)
KOBAYASHI RYO (JP)
TAKASAKI TETSUOMI (JP)
UENO TARO (JP)
KOBAYASHI RYO (JP)
TAKASAKI TETSUOMI (JP)
UENO TARO (JP)
Application Number:
PCT/JP2018/011388
Publication Date:
September 26, 2019
Filing Date:
March 22, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G01N35/10; G01N37/00
Foreign References:
| JP2010145083A | 2010-07-01 | |||
| JP2008224431A | 2008-09-25 | |||
| US20110243813A1 | 2011-10-06 | |||
| JP2006170742A | 2006-06-29 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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