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Patent Searching and Data


Title:
FLUORINE GAS PRODUCTION DEVICE AND LIGHT SCATTERING DETECTOR
Document Type and Number:
WIPO Patent Application WO/2021/131578
Kind Code:
A1
Abstract:
Provided is a fluorine gas production device capable of suppressing blockage of a pipe and a valve by mist. A flow path of this fluorine gas production device has: a first flow path for sending fluid from the inside of an electrolytic cell to a fluorine gas selection part by passage through a mist removal part for removing mist from the fluid; a second flow path for sending the fluid from the inside of the electrolytic cell to the fluorine gas selection part without passage through the mist removal part; and a flow path switching part which switches between the flow paths for flowing the fluid in accordance with an average particle size of mist measured by an average particle size measurement part. When the average particle size of mist measured by the average particle size measurement part is not more than a preset reference value, the flow path switching part is configured to send the fluid from the inside of the electrolytic cell to the first flow path. When the average particle value of mist is greater than the preset reference value, the flow path switching part is configured to send the fluid from the inside of the electrolytic cell to the second flow path. The second flow path has a blockage suppression mechanism that suppresses blockage of the second flow path by mist.

Inventors:
MIKAMI KATSUMI (JP)
FUKUCHI YOHSUKE (JP)
KOBAYASHI HIROSHI (JP)
Application Number:
PCT/JP2020/045092
Publication Date:
July 01, 2021
Filing Date:
December 03, 2020
Export Citation:
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Assignee:
SHOWA DENKO KK (JP)
International Classes:
G01N15/02; C25B1/24; C25B9/00
Foreign References:
JP2011225922A2011-11-10
JP2013507629A2013-03-04
JP2004353015A2004-12-16
US20160306367A12016-10-20
JP2007071831A2007-03-22
JP5584904B22014-09-10
JPS5919824B21984-05-09
Attorney, Agent or Firm:
TANAKA Hidetetsu et al. (JP)
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