FOCUS TEST MASK, FOCUS MEASURING METHOD, EXPOSURE APPARATUS, AND EXPOSURE METHOD

Title:

FOCUS TEST MASK, FOCUS MEASURING METHOD, EXPOSURE APPARATUS, AND EXPOSURE METHOD

Document Type and Number:

WIPO Patent Application WO/2011/055758

Kind Code:

A1

Abstract:

Disclosed is a focus test reticle for measuring focus information. The focus test reticle has an outer pattern, and the outer pattern has: a line pattern composed of a light blocking film extending in the Y direction; a phase shift section, which is provided on the positive X direction side of the line pattern, and has a line width smaller than that of the line pattern; a light transmitting section, which is provided on the negative X direction side of the line pattern, and has a line width smaller than that of the line pattern; a light transmitting section, which is provided on the positive X direction side of the phase shift section; and a phase shift section which is provided on the negative X direction side of the light transmitting section. The focus information of a projection optical system can be measured with high measurement repeatability and high measuring efficiency.

Inventors:

HIRUKAWA SHIGERU (JP)
KONDO SHINJIRO (JP)

Application Number:

PCT/JP2010/069626

Publication Date:

May 12, 2011

Filing Date:

November 04, 2010

Export Citation:

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Assignee:

NIKON CORP (JP)
HIRUKAWA SHIGERU (JP)
KONDO SHINJIRO (JP)

International Classes:

G01B11/00; G03F1/00; G03F7/20; H01L21/027

Domestic Patent References:

WO2005004211A1

2005-01-13

Foreign References:

JP2006080299A	2006-03-23
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Other References: