Title:
FOREIGN MATTER REMOVAL DEVICE, PELLICLE PRODUCTION DEVICE, PELLICLE PRODUCTION METHOD, AND PELLICLE
Document Type and Number:
WIPO Patent Application WO/2024/048365
Kind Code:
A1
Abstract:
A foreign matter removal device according to the present disclosure comprises: a vacuum ultraviolet light generation unit that generates vacuum ultraviolet light; an irradiation container for irradiating a pellicle film with the vacuum ultraviolet light; and a gas supply unit that supplies an inert gas to the irradiation container. The irradiation container has: an irradiation chamber which is provided with a gas supply opening for supplying the inert gas and a gas discharge opening for discharging the inert gas; a transparent part which is provided at a boundary of the irradiation chamber and through which the vacuum ultraviolet light transmits; and a stage which is disposed in the irradiation chamber and on which the pellicle film is to be placed. The gas supply unit is connected to the gas supply opening.
Inventors:
ITO KEN (JP)
TANEICHI DAIKI (JP)
KOHMURA KAZUO (JP)
OKUBO ATSUSHI (JP)
TANEICHI DAIKI (JP)
KOHMURA KAZUO (JP)
OKUBO ATSUSHI (JP)
Application Number:
PCT/JP2023/030137
Publication Date:
March 07, 2024
Filing Date:
August 22, 2023
Export Citation:
Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
G03F1/62; G03F1/82; G03F7/20
Domestic Patent References:
| WO2016136343A1 | 2016-09-01 |
Foreign References:
| US20100190095A1 | 2010-07-29 | |||
| JPH05323584A | 1993-12-07 | |||
| JP2022507168A | 2022-01-18 | |||
| CN101989037A | 2011-03-23 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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