Title:
GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2021/220935
Kind Code:
A1
Abstract:
A gas barrier film 10 comprises, in this order: a substrate layer 1 containing polypropylene; a resin layer 2 containing a copolymer of propylene and another monomer; a vapor deposition layer 3 of an inorganic oxide; and a gas barrier layer 4. The thickness of the vapor deposition layer 3 is 5 to 300 nm, and the thickness of the resin layer 2 is 0.3 μm or greater. There is at least one softening temperature found on the vapor deposition layer 3 side surface of of the resin layer 2 within a range from 100℃ to 170℃ as determined by localized thermal analysis (LTA).
Inventors:
FUKUGAMI MIKI (JP)
FURUTA KAORU (JP)
FURUTA KAORU (JP)
Application Number:
PCT/JP2021/016307
Publication Date:
November 04, 2021
Filing Date:
April 22, 2021
Export Citation:
Assignee:
TOPPAN INC (JP)
International Classes:
B32B9/00; B32B27/32; B65D65/40
Domestic Patent References:
| WO2009084518A1 | 2009-07-09 |
Foreign References:
| JPH09290477A | 1997-11-11 | |||
| JPH1199587A | 1999-04-13 | |||
| JPH07329258A | 1995-12-19 | |||
| JP2001009976A | 2001-01-16 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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