Title:
GAS OUTLET ELEMENT OF A CVD REACTOR
Document Type and Number:
WIPO Patent Application WO/2021/069598
Kind Code:
A3
Abstract:
The invention relates to a gas outlet element for use in a CVD reactor, comprising an annular upper part (11) with gas outlet openings (7) arranged about a circular surface. A base surface (18) of the upper part (11), said surface extending parallel to the circular surface, sits on a lower part (12) which forms a gas collecting channel (8). A process chamber wall (17) is first integrally formed on the upper part (11), wherein the process chamber wall has a shoulder (19) at the upper end of the process chamber wall, said shoulder projecting beyond the gas outlet openings (7) at least in some regions radially inwards with respect to a direction (S) parallel to a central axis (A) of the circular surface, and the gas outlet opening (7) axis (B) sections pointing upwards are inclined towards the axis (A). Furthermore, the upper part (11) forms a first slot wall (15) and the lower part (12) forms a second slot wall (16), which runs parallel to the first slot wall (15), of a slot (14), which is open in the direction of the axis (A) of the circular surface, for receiving an edge of a plate (10).
Inventors:
KOLLBERG MARCEL (DE)
MUKINOVIC MERIM (DE)
BASTKE TORSTEN WERNER (DE)
RUDA Y WITT FRANCISCO (DE)
MUKINOVIC MERIM (DE)
BASTKE TORSTEN WERNER (DE)
RUDA Y WITT FRANCISCO (DE)
Application Number:
PCT/EP2020/078290
Publication Date:
June 03, 2021
Filing Date:
October 08, 2020
Export Citation:
Assignee:
AIXTRON SE (DE)
International Classes:
C23C16/44; C23C16/455; C30B25/12; C30B25/14
Domestic Patent References:
| WO2007076195A2 | 2007-07-05 |
Foreign References:
| US20130206066A1 | 2013-08-15 | |||
| DE102009043848A1 | 2011-03-03 | |||
| DE102015120329A1 | 2016-06-09 |
Attorney, Agent or Firm:
GRUNDMANN, Dirk et al. (DE)
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