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Title:
GATED PHOTOCATHODE FOR CONTROLLED SINGLE AND MULTIPLE ELECTRON BEAM EMISSION
Document Type and Number:
WIPO Patent Application WO1999050874
Kind Code:
A3
Abstract:
A photocathode (300) having a gate electrode (307) so that modulation of the resulting electron beam is accomplished independently of the light beam (303). The photocathode includes a transparent substrate (301), a photoemitter (302), and an electrically separate gate electrode (307) surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

Inventors:
LEE KIM Y
CHANG TAI-HON PHILIP
MANKOS MARIAN
BERGLUND C NEIL
Application Number:
PCT/US1999/005584
Publication Date:
February 17, 2000
Filing Date:
March 16, 1999
Export Citation:
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Assignee:
ETEC SYSTEMS INC (US)
International Classes:
G03F7/20; H01J1/34; H01J37/063; H01J9/12; H01J37/073; (IPC1-7): H01J37/073; H01J3/02; G03F7/20
Foreign References:
US4460831A1984-07-17
EP0642147A11995-03-08
US5751109A1998-05-12
Other References:
SCHNEIDER J E ET AL: "SEMICONDUCTOR ON GLASS PHOTOCATHODES AS HIGH-PERFORMANCE SOURCES FOR PARALLEL ELECTRON BEAM LITHOGRAPHY", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, vol. 14, no. 6, 1 November 1996 (1996-11-01), pages 3782 - 3786, XP000721111
CHANG T H P ET AL: "ELECTRON BEAM TECHNOLOGY - SEM TO MICROCOLUMN", MICROELECTRONIC ENGINEERING, vol. 32, no. 1/04, 1 September 1996 (1996-09-01), pages 113 - 130, XP000624903
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