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Title:
GROWTH INHIBITOR FOR FORMING PELLICLE PROTECTIVE THIN FILM, METHOD FOR FORMING PELLICLE PROTECTIVE THIN FILM BY USING SAME, AND MASK MANUFACTURED THEREFROM
Document Type and Number:
WIPO Patent Application WO/2022/010214
Kind Code:
A1
Abstract:
The present invention relates to a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom and, more specifically, to a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom, the growth inhibitor being a compound represented by chemical formula 1 of AnBmXoYiZj (A is carbon or silicon, B is hydrogen or a C1-3 alkyl, X is at least one of fluorine (F), chlorine (Cl), bromine (Br) and iodine (I), Y and Z are independently at least one selected from the group consisting of oxygen, nitrogen, sulfur and fluorine and are not the same as each other, n is an integer of 1-15, o is an integer of 1 or more, m is 0-2n+1, and i and j are each an integer of 0-3.). According to the present invention, provided are a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom, the growth inhibitor preventing, without lowering the transmittance of a pellicle, corrosion or deterioration, and thus can significantly improve the lifespan of a mask employing same.

Inventors:
YEON CHANG BONG (KR)
JUNG JAE SUN (KR)
DO SEUNG CHUL (KR)
WANG HO LIM (KR)
Application Number:
PCT/KR2021/008539
Publication Date:
January 13, 2022
Filing Date:
July 06, 2021
Export Citation:
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Assignee:
SOULBRAIN CO LTD (KR)
International Classes:
C23C16/455; G03F1/62
Foreign References:
KR20190003752A2019-01-09
KR20140035818A2014-03-24
KR20090101437A2009-09-28
KR20190061877A2019-06-05
KR102229118B12021-03-18
Attorney, Agent or Firm:
NEWKOREA PATENT & LAW FIRM (KR)
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