Title:
HIGH-FREQUENCY POWER SYSTEM AND PLASMA PROCESSING APPARATUS PROVIDED THEREWITH
Document Type and Number:
WIPO Patent Application WO/2015/151148
Kind Code:
A1
Abstract:
This invention provides a high-frequency power system and the like in which a device that supplies high-frequency power is easy to replace, assembly is highly reproducible, and the energy efficiency of the high-frequency-power-supplying system as a whole is high. This high-frequency power system is provided with load units (5, 6) that consume high-frequency power, high-frequency power supplies (12, 22) that supply high-frequency power to said load units (5, 6), and matchers (14, 24) that are connected between the load units (5, 6) and the high-frequency power supplies (12, 22) and match the load impedances of the high-frequency power supplies (12, 22) to the impedances of the high-frequency power supplies (12, 22). The load units (5, 6), the high-frequency power supplies (12, 22), and the matchers (14, 24) are provided, respectively, inside spaces that are closed by grounded electromagnetic-shielding members (18, 28).
Inventors:
HAYAMI TOSHIHIRO (JP)
Application Number:
PCT/JP2014/059426
Publication Date:
October 08, 2015
Filing Date:
March 31, 2014
Export Citation:
Assignee:
SPP TECHNOLOGIES CO LTD (JP)
International Classes:
H01L21/3065
Foreign References:
| JP2006073354A | 2006-03-16 | |||
| JP2002313785A | 2002-10-25 | |||
| JP2002319576A | 2002-10-31 | |||
| JP2002056999A | 2002-02-22 | |||
| JP2008306042A | 2008-12-18 |
Attorney, Agent or Firm:
MURAKAMI, SATOSHI (JP)
Tomoji Murakami (JP)
Tomoji Murakami (JP)
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