Title:
HIGH-FREQUENCY TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/204282
Kind Code:
A1
Abstract:
Provided is a high-frequency treatment device that can appropriately control the temperature of an electrode from the viewpoint of treatment of a subject for treatment using the electrode. In a state in which the measured temperature Θ of or around the electrode is lower than a lower temperature limit Θ0 − ΔΘ1 of a target temperature range, the pulse width wp of a pulse signal is increased and the pulse period Tp thereof is reduced. In this way, high-frequency power that is outputted to the electrode is gradually increased so that the measured temperature Θ is greater than or equal to the lower temperature limit Θ0 − ΔΘ1. In a state in which the measured temperature Θ of or around the electrode is higher than an upper temperature limit Θ0 + ΔΘ2 of the target temperature range, the pulse width wp of the pulse signal is reduced and the pulse period Tp thereof is increased. In this way, the high-frequency power that is outputted to the electrode is gradually reduced so that the measured temperature Θ is less than or equal to the upper temperature limit Θ0 + ΔΘ2.
Inventors:
IKEUCHI ATSUSHI (JP)
Application Number:
PCT/JP2023/015833
Publication Date:
October 26, 2023
Filing Date:
April 20, 2023
Export Citation:
Assignee:
KK TOP (JP)
International Classes:
A61B18/12
Domestic Patent References:
| WO2020262279A1 | 2020-12-30 |
Foreign References:
| JP2019524396A | 2019-09-05 | |||
| CN107536640A | 2018-01-05 | |||
| JP2000342599A | 2000-12-12 | |||
| US20070219549A1 | 2007-09-20 | |||
| US20040082946A1 | 2004-04-29 |
Attorney, Agent or Firm:
DELOITTE TOHMATSU IP FIRM (JP)
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