Title:
RESIN COMPOSITION FOR THERMOSETTING PHOTO-ALIGNMENT FILMS
Document Type and Number:
WIPO Patent Application WO/2023/204281
Kind Code:
A1
Abstract:
[Problem] To provide a curable film formation composition, which makes it possible to sufficiently reduce the concentration of formaldehyde in a liquid composition and also makes it possible to prevent the increase of formaldehyde over time. [Solution] Provided is a curable film formation composition comprising (A) a compound having a photo-aligning group, (B) a crosslinking agent having a N-hydroxymethyl group or a N-alkoxymethyl group, and (C1) a compound selected from the group consisting of a compound having a group represented by formula (1), 1,3-cyclohexanedione, dimedone and Meldrum's acid. (In formula (1), Q1 represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a phenyl group; Q2 represents O, S or NQ3; Q3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and a broken line represents a bonding hand.)
Inventors:
NISHIMURA NAOYA (JP)
INOUE SHOTA (JP)
INOUE SHOTA (JP)
Application Number:
PCT/JP2023/015832
Publication Date:
October 26, 2023
Filing Date:
April 20, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G02B5/30; C08F265/04; C08F265/10; C08F291/06; C08L101/06; G02F1/13363; G02F1/1337
Domestic Patent References:
| WO2016143860A1 | 2016-09-15 | |||
| WO2015129889A1 | 2015-09-03 | |||
| WO2019124386A1 | 2019-06-27 |
Foreign References:
| JP2005015642A | 2005-01-20 |
Other References:
ANONYMOUS: "Acetoacetoxyethyl Methacrylate (AAEM) ", EASTMAN CHEMICAL COMPANY - MATERIAL SAFETY DATA SHEET, 25 January 1999 (1999-01-25), pages 1 - 8, XP093102678, Retrieved from the Internet [retrieved on 20231117]
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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