Title:
HYPOCHLORITE WATER
Document Type and Number:
WIPO Patent Application WO/2022/138427
Kind Code:
A1
Abstract:
According to the present invention, provided is hypochlorite water in which the ion concentration of sodium ions per 100 ppm of effective chlorine concentration is at most 20 ppm, and the content of a silicon compound is at most 20 ppb in terms of silicon, and which has high storage stability.
Inventors:
KONDO HITOSHI (JP)
INUI YOJI (JP)
USHIODA EMI (JP)
ANDO AKIHIRO (JP)
INUI YOJI (JP)
USHIODA EMI (JP)
ANDO AKIHIRO (JP)
Application Number:
PCT/JP2021/046459
Publication Date:
June 30, 2022
Filing Date:
December 16, 2021
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
C01B11/04; A01N25/02; A01N59/00; A01N59/08; A01P1/00; A01P3/00; A61L9/01
Domestic Patent References:
| WO2011135645A1 | 2011-11-03 |
Foreign References:
| JP2013039553A | 2013-02-28 | |||
| JP2020117422A | 2020-08-06 | |||
| JP2019218436A | 2019-12-26 | |||
| JP2019218246A | 2019-12-26 | |||
| JP2017222535A | 2017-12-21 | |||
| JP2011068521A | 2011-04-07 |
Attorney, Agent or Firm:
KIMURA, Yoshihiro (JP)
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