IMPRINT DEVICE AND ARTICLE MANUFACTURING METHOD

WIPO Patent Application WO/2019/078060

A1

The present invention provides an imprint device for forming a pattern of imprint material on a substrate using a mold. The imprint device is characterized by comprising: an optical system for irradiating a peripheral region including an end of a mesa portion of a mold with irradiating light for increasing the viscosity of imprint material, the peripheral region surrounding the mesa portion, in a state in which the mesa portion is contacted with the imprint material; and a control unit which, in a state in which the mesa portion of the mold is contacted with the imprint material on the substrate, controls the optical system in such a way that a plurality of regions (52a to 52h, 52n) in the peripheral region that have mutually different distances from the center of the mesa portion are irradiated with the irradiating light at mutually different timings.

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KOIDE HIROYUKI (JP)
FUNAYOSHI TOMOMI (JP)
KOBAYASHI KENICHI (JP)
HAYASHI TATSUYA (JP)

PCT/JP2018/037705

April 25, 2019

October 10, 2018

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CANON KK (JP)

H01L21/027; B29C59/02

JP2011521438A	2011-07-21
JP2013069918A	2013-04-18
JP2011181548A	2011-09-15
JP2014188869A	2014-10-06
JP2015106670A	2015-06-08
JP2017147283A	2017-08-24
JP2013069919A	2013-04-18

ABE Takuma et al. (JP)

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