Title:
ION MILLING DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/249371
Kind Code:
A1
Abstract:
With respect to an ion source 101, an ion milling device according to the present invention applies a discharge voltage Vd between an anode 203 and a cathode 201, 202, and applies an acceleration voltage Va between the anode and an acceleration electrode 205, in a state in which an ion beam from the ion source is being shielded by a shutter 102, and after either a discharge current that flows between the anode and the cathode as a result of a discharge, or an ion beam current that flows as a result of the shutter being irradiated by the ion beam drops below a predetermined reference value, the shutter is allowed to be retracted by a shutter drive source 103 to a position in which the ion beam is not shielded.
Inventors:
AIDA SHOTA (JP)
TAKASU HISAYUKI (JP)
HORINOUCHI KENTO (JP)
TAKASU HISAYUKI (JP)
HORINOUCHI KENTO (JP)
Application Number:
PCT/JP2021/020112
Publication Date:
December 01, 2022
Filing Date:
May 27, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/305; H01J27/04
Domestic Patent References:
| WO2016189614A1 | 2016-12-01 |
Foreign References:
| DE102016105462A1 | 2017-06-01 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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