Title:
LAMP ARRAY FOR THERMAL PROCESSING EXHIBITING IMPROVED RADIAL UNIFORMITY
Document Type and Number:
WIPO Patent Application WO2006036644
Kind Code:
A3
Abstract:
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them. The radiance pattern includes a variation in diffuseness or collimation. In one embodiment, the center lines of all of the lamps are disposed away from the center axis. The array can be a hexagonal array, in which the center axis is located at a predetermined position between neighboring lamps.
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Inventors:
RANISH JOSEPH M (US)
TANASA CORINA E (US)
RAMAMURTHY SUNDAR (US)
LAI CLAUDIA (US)
JALLEPALLY RAVI (US)
BALASUBRAMANIAN RAMACHANDRAN (US)
HUNTER AARON M (US)
TJANDRA AGUS (US)
TAM NORMAN (US)
TANASA CORINA E (US)
RAMAMURTHY SUNDAR (US)
LAI CLAUDIA (US)
JALLEPALLY RAVI (US)
BALASUBRAMANIAN RAMACHANDRAN (US)
HUNTER AARON M (US)
TJANDRA AGUS (US)
TAM NORMAN (US)
Application Number:
PCT/US2005/033570
Publication Date:
August 24, 2006
Filing Date:
September 20, 2005
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
H01L21/00; H05B3/00
Foreign References:
| US6108490A | 2000-08-22 | |||
| US4356384A | 1982-10-26 |
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