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Patent Searching and Data


Title:
Laryngeal Mask Device
Document Type and Number:
WIPO Patent Application WO/2017/201645
Kind Code:
A1
Abstract:
A cuff structure (20b) for a laryngeal mask device (100) comprises an inner-layer cuff (20b1) that defines an annular main chamber of the cuff structure (20b) to be inflated or self-inflated, and an outer-layer cuff (20b2) that surrounds the inner-layer cuff (20b1). The outer-layer cuff (20b2) has a higher elongation rate and a thinner thickness than the inner-layer cuff (20b1), so that the cuff structure (20b) can comply with the tissue structure of the patient very even. With this dual-layer cuff structure (20b), the leakage resistance of the laryngeal mask device (100) will be improved.

Inventors:
XIE DANG (CN)
MA ALLEN (CN)
ZHOU RENNY (CN)
ZHU JUSTINA (CN)
Application Number:
PCT/CN2016/082978
Publication Date:
November 30, 2017
Filing Date:
May 23, 2016
Export Citation:
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Assignee:
COVIDIEN LP (US)
XIE DANG (CN)
International Classes:
A61M16/04
Domestic Patent References:
WO2015138932A12015-09-17
Foreign References:
CN105107072A2015-12-02
CN103429291A2013-12-04
CN202740564U2013-02-20
CN1771067A2006-05-10
CN203001631U2013-06-19
US20130037035A12013-02-14
Attorney, Agent or Firm:
CCPIT PATENT AND TRADEMARK LAW OFFICE (CN)
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