Title:
LIQUEFIED GAS DISCHARGE/SUPPLY DEVICE, SYSTEM, AND METHOD
Document Type and Number:
WIPO Patent Application WO/2021/024350
Kind Code:
A1
Abstract:
Provided are a liquefied gas discharge/supply device and system that enable the elimination of a centrally provided storage device or mechanism for generating a gas which is a vapor, while ensuring the generation of gas which is a vapor at a pressure less than the vapor pressure, from a fluid that is a liquefied gas, and ensuring the discharge/supply of said gas with a desired flow rate characteristic from a plurality of locations. This configuration enables the fluid to be divided among and stored in a plurality of storage devices, which are connected to each other via a piping system and thereby function as an integrated storage container, while at the same time the gas which is a vapor, the pressure of which has been reduced to a low pressure less than or equal to the vapor pressure, is generated in a divided manner at each location.
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Inventors:
KAWAGUCHI JUNICHIRO (JP)
Application Number:
PCT/JP2019/030704
Publication Date:
February 11, 2021
Filing Date:
August 05, 2019
Export Citation:
Assignee:
PATCHEDCONICS LLC (JP)
International Classes:
F17C9/02
Foreign References:
| JP2010271014A | 2010-12-02 | |||
| KR20170073234A | 2017-06-28 | |||
| CN206257446U | 2017-06-16 | |||
| JP2001263653A | 2001-09-26 | |||
| JP2015127510A | 2015-07-09 |
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