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Title:
LOW-DIELECTRIC SUBSTRATE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2022/224899
Kind Code:
A1
Abstract:
A low-dielectric substrate material (1) comprises a metal layer (2) and a porous resin layer (3) disposed on one surface, along the thickness direction, of the metal layer (2). The porous resin layer (3) can be equally divided in the thickness direction into four portions, which are a first region (31), a second region (32), a third region (33), and a fourth region (34) that are located in this order along the receding direction from the metal layer (2). The first region (31) has, in a resin matrix (35), a plurality of closed cells (30) independent of each other, and the plurality of closed cells (30) in the first region (31) have an average aspect ratio AR of 0.80-1.20. The average aspect ratio AR is the ratio (L1/L2), in a cross-sectional view, of the length L1 of the closed cell (30) in a direction orthogonal to the thickness direction to the length L2 of the closed cell (30) in the thickness direction.

Inventors:
IMAIZUMI TAKU (JP)
MATSUTOMI AKIHITO (JP)
NAGAMI NAOTO (JP)
Application Number:
PCT/JP2022/017795
Publication Date:
October 27, 2022
Filing Date:
April 14, 2022
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
B32B5/18; C08J9/26; B32B5/22; B32B5/24; B32B7/022; B32B15/08; B32B27/08; C08G73/10; H01Q1/38; H05K1/03
Domestic Patent References:
WO2020066146A12020-04-02
WO2018186486A12018-10-11
WO2016159060A12016-10-06
Foreign References:
JP2018021172A2018-02-08
JP2020049897A2020-04-02
JP2001270034A2001-10-02
JP2014132057A2014-07-17
US20070003773A12007-01-04
US20170241604A12017-08-24
Attorney, Agent or Firm:
OKAMOTO, Hiroyuki et al. (JP)
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