Title:
MARK DETECTION APPARATUS, MARK DETECTION METHOD, MEASURING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/209132
Kind Code:
A1
Abstract:
This mark detection device for detecting a mark M formed in a mark region of an object (41) is provided with: a first optical system (52a) that outputs measuring light toward the mark region; a second optical system (53a) that irradiates the mark region with at least a part of zero-order light and diffracted light, which have been generated due to the irradiation from the first optical system to the mark region; and a photoreceiver (55a) that receives at least a part of zero-order light and diffracted light, which have been generated due to the irradiation from the second optical system to the mark region.
Inventors:
EGAMI SHIGEKI (JP)
NAKAKOJI YOSHIFUMI (JP)
NAKAKOJI YOSHIFUMI (JP)
Application Number:
PCT/JP2017/020118
Publication Date:
December 07, 2017
Filing Date:
May 30, 2017
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
International Classes:
G03F9/00; G01B11/00; G03F7/20
Foreign References:
| JPH09293663A | 1997-11-11 | |||
| JPH06317534A | 1994-11-15 | |||
| JPH0221613A | 1990-01-24 |
Other References:
See also references of EP 3467591A4
Attorney, Agent or Firm:
EGAMI, Tatsuo (JP)
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