Title:
MASK, FILM FORMING METHOD, AND FILM FORMING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2024/062802
Kind Code:
A1
Abstract:
This mask has an opening for forming a film of a pattern made of a vapor deposition material on a substrate and includes a mask body made of a non-magnetic substance and having the opening and a magnetic body formed on the mask body.
Inventors:
NAGAOKA KEN (JP)
ICHIHARA MASAHIRO (JP)
ICHIHARA MASAHIRO (JP)
Application Number:
PCT/JP2023/029421
Publication Date:
March 28, 2024
Filing Date:
August 14, 2023
Export Citation:
Assignee:
CANON TOKKI CORP (JP)
International Classes:
C23C14/04; H01L21/68; H01L21/683; H05B33/10; H10K50/10
Foreign References:
JP2006233286A | 2006-09-07 | |||
JP2010209441A | 2010-09-24 | |||
JP2006188731A | 2006-07-20 | |||
JP2015028204A | 2015-02-12 |
Attorney, Agent or Firm:
OHTSUKA PATENT OFFICE, P.C. (JP)
Download PDF:
Previous Patent: FILM FORMING APPARATUS AND FILM FORMING METHOD
Next Patent: INFORMATION PROCESSING METHOD, INFORMATION PROCESSING DEVICE, AND PROGRAM
Next Patent: INFORMATION PROCESSING METHOD, INFORMATION PROCESSING DEVICE, AND PROGRAM