Title:
MASK UNIT, SUBSTRATE PROCESSING DEVICE, METHOD FOR PRODUCING MASK UNIT, AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/136834
Kind Code:
A1
Abstract:
This substrate processing device forms a photosensitive layer resulting from forming at the surface of a substrate the pattern of a mask held along a cylindrical plane, and is provided with: a mask holding section that is provided with a mask holding surface for holding the mask along the cylindrical plane and that can rotated around a predetermined axis line; a revolving holding section that can revolve around an axis line approximately parallel to the predetermined axis line and that is provided with a substrate holding surface at which the substrate is contacted/held; and a gap forming section that forms a predetermined amount of gap between the mask holding surface and the substrate holding surface.
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Inventors:
SUZUKI TOMONARI (JP)
KIUCHI TOHRU (JP)
KATO MASAKI (JP)
KITO YOSHIAKI (JP)
KIUCHI TOHRU (JP)
KATO MASAKI (JP)
KITO YOSHIAKI (JP)
Application Number:
PCT/JP2013/050554
Publication Date:
September 19, 2013
Filing Date:
January 15, 2013
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/24; G03F7/20
Domestic Patent References:
| WO2013035489A1 | 2013-03-14 |
Foreign References:
| JP2003516563A | 2003-05-13 | |||
| JP2000275865A | 2000-10-06 | |||
| JP2011090172A | 2011-05-06 | |||
| JPS54121971A | 1979-09-21 | |||
| JP2012220760A | 2012-11-12 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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