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Title:
MASK
Document Type and Number:
WIPO Patent Application WO/2022/230587
Kind Code:
A1
Abstract:
The present invention provides a mask in which it is easy to form, in appropriate shapes, a covering part and upper/lower supporting parts. This mask (1) has a covering part (10) which covers the mouth of a wearer and which is made of a film having a light transmittance of at least 80%. When an antifogging evaluation is performed that involves executing, in an environment in a measurement chamber at an ambient temperature of 25°C, a cloudy weather step, in which a transition from 30%-humidity toward 70%-humidity is made through 200 rounds of changes at a 3-second interval, and a fair weather step, in which, following the cloudy weather step, a transition is made from 70%-humidity toward 30%-humidity through 90 rounds of changes at a 3-second interval, the covering part exhibits a compressive antifogging index of 15 or more at a humidity of 70% or higher.

Inventors:
SUDA TOMOKAZU (JP)
TANIGUCHI HIROAKI (JP)
WAKASUGI KEI (JP)
KENMOCHI YASUHIKO (JP)
Application Number:
PCT/JP2022/016118
Publication Date:
November 03, 2022
Filing Date:
March 30, 2022
Export Citation:
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Assignee:
UNICHARM CORP (JP)
International Classes:
A62B18/02; A41D13/11
Domestic Patent References:
WO2009104442A12009-08-27
Foreign References:
US20080092909A12008-04-24
KR20200144518A2020-12-29
JP2006525823A2006-11-16
JPH0724078A1995-01-27
CN212971783U2021-04-16
JP2017002454A2017-01-05
KR102215410B12021-02-15
US20180007982A12018-01-11
JP2009011475A2009-01-22
US4323063A1982-04-06
Attorney, Agent or Firm:
OZAWA IP FIRM (JP)
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