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Patent Searching and Data


Title:
MASKLESS LASER DIRECT WRITING SYSTEM AND MASKLESS LASER DIRECT WRITING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/141772
Kind Code:
A1
Abstract:
A maskless laser direct writing system and a maskless laser direct writing method. The maskless laser direct writing system comprises: W fiber arrays each comprising several fibers arranged in M rows and N columns; a sample stage adapted to carry a wafer to be photoetched, said wafer comprising at least V chip areas; a layout data conversion module adapted to convert target etching layout into a modular graphic according to parameters of the fiber arrays, the modular graphic comprising several target graphics modules, each target graphics module comprising several target graphics units arranged in M rows and N columns, each target graphics unit comprising several grids arranged in K rows and J columns, and any fiber in the w-th fiber array is adapted to process a target graphics unit in each target graphics module of the (i×w)-th chip area; and a control module. The maskless laser direct writing system can improve graphical efficiency.

Inventors:
CHEN DAPENG (CN)
FU JIANYU (CN)
Application Number:
PCT/CN2021/076794
Publication Date:
July 07, 2022
Filing Date:
February 19, 2021
Export Citation:
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Assignee:
WUXI IOT INNOVATION CENTER CO LTD (CN)
International Classes:
G03F7/20
Foreign References:
CN105974748A2016-09-28
CN101477306A2009-07-08
CN201345033Y2009-11-11
US4516832A1985-05-14
KR20170091825A2017-08-10
Attorney, Agent or Firm:
SUNSHINE INTELLECTUAL PROPERTY INTERNATIONAL CO., LTD. (CN)
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