Title:
MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN
Document Type and Number:
WIPO Patent Application WO/2023/153482
Kind Code:
A1
Abstract:
Provided are: a material for metal patterning, that can strongly suppress the formation of a metal thin film at a film surface; a heterocyclic compound; a thin film for metal patterning that uses these; an organic electroluminescent device; a method for forming a metal pattern; and an electronic device. The material for metal patterning is represented by formula (A1) or (B1), wherein in the formulas each A independently represents N or CR with at least one being N and at least one being CR; and B represents N, NR, S, O, or CR with at least one being N, S, or O and at least one being CR.
Inventors:
KAWASHIMA HIROYUKI (JP)
KOIKE KENJI (JP)
MATSUMOTO NAOKI (JP)
NOMURA SHINTARO (JP)
OTA ERIKO (JP)
HATTORI KAZUKI (JP)
KOIKE KENJI (JP)
MATSUMOTO NAOKI (JP)
NOMURA SHINTARO (JP)
OTA ERIKO (JP)
HATTORI KAZUKI (JP)
Application Number:
PCT/JP2023/004430
Publication Date:
August 17, 2023
Filing Date:
February 09, 2023
Export Citation:
Assignee:
TOSOH CORP (JP)
International Classes:
C07D251/34; H10K85/60; C07D401/04; H01L21/3065; H10K50/805; H10K50/81; H10K71/60; H10K102/20
Domestic Patent References:
| WO2020225778A1 | 2020-11-12 | |||
| WO2021172371A1 | 2021-09-02 | |||
| WO2022034907A1 | 2022-02-17 | |||
| WO2020225778A1 | 2020-11-12 | |||
| WO2021172371A1 | 2021-09-02 | |||
| WO2022034907A1 | 2022-02-17 |
Foreign References:
| KR102324529B1 | 2021-11-12 | |||
| KR102324529B1 | 2021-11-12 |
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