MEMS DEVICE MANUFACTURING METHOD - KOREA ADVANCED INST SCI & TECH

Title:

MEMS DEVICE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2014/119810

Kind Code:

A1

Abstract:

A MEMS device manufacturing method using an amorphous carbon film as a sacrificial layer is provided. According to an embodiment of the present invention, a lower structure is formed. An amorphous carbon film is formed as a sacrificial layer on the lower structure. An upper structure including a sensor structure is formed on the amorphous carbon film. The amorphous carbon film is removed so that the lower structure and the upper structure are spaced apart from each other.

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Inventors:

LIM SUNG KYU (KR)
KIM YOUNG SU (KR)
KIM HEE YEOUN (KR)
KANG MIN HO (KR)
OH JAE SUB (KR)
LEE KWY RO (KR)

Application Number:

PCT/KR2013/000832

Publication Date:

August 07, 2014

Filing Date:

February 01, 2013

Export Citation:

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Assignee:

KOREA ADVANCED INST SCI & TECH (KR)

International Classes:

B81B1/00

Foreign References:

US20060187523A1	2006-08-24
US6664154B1	2003-12-16
KR20040109999A	2004-12-29
US20120170102A1	2012-07-05
US20100181631A1	2010-07-22
KR101250447B1	2013-04-08

Attorney, Agent or Firm:

KIM, Nam-Sik et al. (KR)
김남식 (KR)

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