Title:
METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER
Document Type and Number:
WIPO Patent Application WO2004067800
Kind Code:
B1
Abstract:
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
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Inventors:
ZHAO MAOSHENG (US)
ROCHA-ALVAREZ JUAN CARLOS (US)
SHMURUN INNA (US)
SEN SOOVA (US)
LIM MAO D (US)
VENKATARAMAN SHANKAR (US)
LEE JU-HYUNG (US)
ROCHA-ALVAREZ JUAN CARLOS (US)
SHMURUN INNA (US)
SEN SOOVA (US)
LIM MAO D (US)
VENKATARAMAN SHANKAR (US)
LEE JU-HYUNG (US)
Application Number:
PCT/US2004/002171
Publication Date:
November 25, 2004
Filing Date:
January 27, 2004
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
ZHAO MAOSHENG (US)
ROCHA-ALVAREZ JUAN CARLOS (US)
SHMURUN INNA (US)
SEN SOOVA (US)
LIM MAO D (US)
VENKATARAMAN SHANKAR (US)
LEE JU-HYUNG (US)
ZHAO MAOSHENG (US)
ROCHA-ALVAREZ JUAN CARLOS (US)
SHMURUN INNA (US)
SEN SOOVA (US)
LIM MAO D (US)
VENKATARAMAN SHANKAR (US)
LEE JU-HYUNG (US)
International Classes:
C23C16/44; H01J37/32; (IPC1-7): C23C16/44; H01J37/32
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