METHOD AND APPARATUS FOR MANUFACTURING PHOTOMASK AND METHOD OF FABRICATING DEVICE

Title:

METHOD AND APPARATUS FOR MANUFACTURING PHOTOMASK AND METHOD OF FABRICATING DEVICE

Document Type and Number:

WIPO Patent Application WO/1999/034255

Kind Code:

A1

Abstract:

A circuit pattern (35) is magnified $g(b) times to form an original pattern (27), which is magnified $g(a) times to a parent pattern (36). The parent pattern (36) is divided into parent patterns (P1-PN) in a data way. The parent patterns (P1-PN) are transferred onto a wafer by unity magnification projection by means of an electron beam lithography system to produce master reticles (R1-RN). By an optical reduction projection aligner with a reduction ratio of 1/$g(a), reduced images of the parent patterns of the master reticles (R1-RN) are transferred while joining the images so as to produce a working reticle (34). Thus, an original pattern is precisely formed in a short time.

Inventors:

MAGOME NOBUTAKA (JP)
SHIRAISHI NAOMASA (JP)

Application Number:

PCT/JP1998/005912

Publication Date:

July 08, 1999

Filing Date:

December 25, 1998

Export Citation:

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Assignee:

NIKON CORP (JP)
MAGOME NOBUTAKA (JP)
SHIRAISHI NAOMASA (JP)

International Classes:

G03F1/00; G03F1/78; G03F7/20; (IPC1-7): G03F1/08; H01L21/027

Foreign References:

JPH02144535A	1990-06-04
JPH02143513A	1990-06-01
JPS5463680A	1979-05-22
JPH0737801A	1995-02-07
JPH04252016A	1992-09-08
JPH1090874A	1998-04-10

Other References: