METHOD AND APPARATUS FOR PREPARING THIN FILM

Title:

METHOD AND APPARATUS FOR PREPARING THIN FILM

Document Type and Number:

WIPO Patent Application WO/2006/054393

Kind Code:

A1

Abstract:

A method for preparing a thin film, which comprises admixing a raw material fluid comprising a silane derivative and a hydrocarbon derivative and a carrier fluid comprising carbon dioxide so as to form a supercritical state, generating an active species in a raw material fluid in the resultant supercritical fluid by a catalytic reaction with at least one metal catalyst selected from among platinum, tungsten, cobalt, nickel, iron and an alloy thereof, and spraying the resultant fluid onto a substrate, to thereby form a silicon-containing solid film or a carbon-containing solid film on the substrate; and an apparatus for practicing the method. The above method and apparatus allow a thin film to be formed uniformly over a wide area.

Inventors:

WATANABE EIZO (JP)
WATANABE TOSHIYUKI (JP)
SONE MASATO (JP)
MATSUOKA YOSHINORI (JP)
MIYAKE HIDEO (JP)
IIDA MASAYASU (JP)

Application Number:

PCT/JP2005/018101

Publication Date:

May 26, 2006

Filing Date:

September 30, 2005

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Assignee:

UNIV TOKYO AGRICULTURE (JP)
ITEC CO LTD (JP)
WATANABE EIZO (JP)
WATANABE TOSHIYUKI (JP)
SONE MASATO (JP)
MATSUOKA YOSHINORI (JP)
MIYAKE HIDEO (JP)
IIDA MASAYASU (JP)

International Classes:

C23C16/24; C23C16/44; C23C16/27; H01L21/205; H01L21/314

Foreign References:

JP2000226624A	2000-08-15
JP2001287910A	2001-10-16
JP2004303894A	2004-10-28
JP2000195801A	2000-07-14
JP2000077342A	2000-03-14
JP2003082463A	2003-03-19
JP2000239846A	2000-09-05

Attorney, Agent or Firm:

Suzue, Shoji (2-4 Komatsubara-cho, Kita-ku, Osaka-sh, Osaka 18, JP)

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