Title:
METHOD AND APPARATUS FOR PRODUCING EXTREME ULTRAVIOLETT RADIATION OR SOFT X-RAY RADIATION
Document Type and Number:
WIPO Patent Application WO2005025280
Kind Code:
A3
Abstract:
A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced.The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
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Inventors:
JONKERS JEROEN (DE)
VAUDREVANGE DOMINIK MARCEL (DE)
NEFF WILLI (DE)
VAUDREVANGE DOMINIK MARCEL (DE)
NEFF WILLI (DE)
Application Number:
PCT/IB2004/051651
Publication Date:
June 16, 2005
Filing Date:
September 01, 2004
Export Citation:
Assignee:
KONINKL PHILIPS ELECTRONICS NV (NL)
FRAUNHOFER GES FORSCHUNG (DE)
JONKERS JEROEN (DE)
VAUDREVANGE DOMINIK MARCEL (DE)
NEFF WILLI (DE)
FRAUNHOFER GES FORSCHUNG (DE)
JONKERS JEROEN (DE)
VAUDREVANGE DOMINIK MARCEL (DE)
NEFF WILLI (DE)
International Classes:
H05G2/00; (IPC1-7): H05G2/00
Domestic Patent References:
WO2001095362A1 | 2001-12-13 |
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