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Title:
METHOD AND APPARATUS FOR PRODUCING EXTREME ULTRAVIOLETT RADIATION OR SOFT X-RAY RADIATION
Document Type and Number:
WIPO Patent Application WO2005025280
Kind Code:
A3
Abstract:
A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced.The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).

Inventors:
JONKERS JEROEN (DE)
VAUDREVANGE DOMINIK MARCEL (DE)
NEFF WILLI (DE)
Application Number:
PCT/IB2004/051651
Publication Date:
June 16, 2005
Filing Date:
September 01, 2004
Export Citation:
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Assignee:
KONINKL PHILIPS ELECTRONICS NV (NL)
FRAUNHOFER GES FORSCHUNG (DE)
JONKERS JEROEN (DE)
VAUDREVANGE DOMINIK MARCEL (DE)
NEFF WILLI (DE)
International Classes:
H05G2/00; (IPC1-7): H05G2/00
Domestic Patent References:
WO2001095362A12001-12-13
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