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Title:
METHOD FOR DESIGNING MULTI-STAGE ELECTRIC FIELD DUST REMOVAL SYSTEM FOR SEMICONDUCTOR MANUFACTURING CLEAN ROOM SYSTEM
Document Type and Number:
WIPO Patent Application WO/2020/216354
Kind Code:
A1
Abstract:
A method for designing a multi-stage electric field dust removal system for a semiconductor manufacturing clean room system, comprising the following steps: selecting the number n of electric field devices in a multi-stage electric field dust removal system and the voltage of each electric field device power supply so that the total dust removal efficiency of the electric field dust removal system, (100%-(100%-P1%)*(100%-P2%)*…*(100%-Pn%)), is greater than or equal to a predetermined value, and the ozone output is less than or equal to a predetermined value, wherein P1%, P2%... and Pn% are sequentially the dust removal efficiency of the first-stage, the second-stage, ... and the nth-stage electric field devices, respectively, and n is an integer greater than 1. The present method can control the amount of ozone generated below a predetermined value while ensuring the total dust removal efficiency.

Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086849
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
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Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
B03C3/40; A61L9/00
Foreign References:
CN101376034A2009-03-04
CN2269215Y1997-12-03
CN104084312A2014-10-08
CN104275242A2015-01-14
CN103706475A2014-04-09
JP2010110692A2010-05-20
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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