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Title:
MULTI-STAGE ELECTRIC FIELD DUST REMOVAL METHOD FOR SEMICONDUCTOR MANUFACTURING CLEAN ROOM SYSTEM AND SEMICONDUCTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/216353
Kind Code:
A1
Abstract:
A multi-stage electric field dust removal method for a semiconductor manufacturing clean room system and a semiconductor manufacturing method. The multi-stage electric field dust removal method comprises the following steps: causing gas to pass through each electric field device connected in series to a multi-stage electric field dust removal system; applying a voltage to each electric field device, the voltage being sufficient to ensure that the total dust removal efficiency of the electric field dust removal system, (100%-(100%-P1%)*(100%-P2%)*...*(100%-Pn%)), is greater than or equal to a predetermined value, and the ozone output is less than or equal to a predetermined value, wherein P1%, P2%... and Pn% are sequentially the dust removal efficiency of the first-stage, the second-stage, ... and the nth-stage electric field devices, respectively, and n is an integer greater than 1; and inputting the gas subjected to dust removal into a clean room. The method implements the effective removal of particulate matter at a high flow rate, the required electric field devices have a small size and lows costs, and operating electricity costs can be reduced. In addition, the ozone output is controlled within a certain range to satisfy the requirements for a semiconductor manufacturing environment.

Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086848
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
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Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
B03C3/40; A61L9/00
Foreign References:
CN101376034A2009-03-04
CN109643681A2019-04-16
CN2269215Y1997-12-03
CN1520935A2004-08-18
CN108499739A2018-09-07
JPH0498034A1992-03-30
US20150090114A12015-04-02
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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