METHOD FOR DETECTING ABNORMAL GROWTH OF GRAPHENE, MEASUREMENT METHOD, AND FILM FORMATION SYSTEM

WIPO Patent Application WO/2020/195670

A1

This method for detecting abnormal growth of graphene includes: measuring, through spectral ellipsometry, the reflectance spectrum of a measurement subject in which a graphene film formed by CVD is provided on a substrate; creating a film structure model to calculate polarization parameters, and incorporating the calculated polarization parameters into the measurement value through fitting; and detecting abnormal growth of graphene on the basis of the value of the degree of conformance when the polarization parameters are fitted.

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IFUKU RYOTA (JP)
MATSUMOTO TAKASHI (JP)
FUJIO AKIRA (JP)
KONO SHIN (JP)

PCT/JP2020/009360

October 01, 2020

March 05, 2020

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TOKYO ELECTRON LTD (JP)

G01J4/04; C01B32/186; G01N21/21

JP2016088766A	2016-05-23
JPH0712714A	1995-01-17
CN102507875A	2012-06-20

ADAMSON, PEEP: "Correlation-free reflection diagnostics of graphene-like surface layers in the infrared region", SURFACE AND INTERFACE ANALYSIS, vol. 47, no. 13, 19 November 2015 (2015-11-19), pages 1161 - 1165, XP055742746
ALBREKTSEN, O. ET AL.: "High resolution imaging of few-layer graphene", JOURNAL OF APPLIED PHYSICS, vol. 111, no. 6, 19 March 2012 (2012-03-19), pages 064305 - 1 - 064305-8, XP012158601, DOI: 10.1063/1.3694660

TAKAYAMA Hiroshi (JP)

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