Title:
METHOD FOR FORMING DENSE SILICIC FILM
Document Type and Number:
WIPO Patent Application WO/2014/057980
Kind Code:
A1
Abstract:
[Problem] To provide a dense silicic film and a method for forming the film.
[Solution] A method for forming a dense silicic film which comprises
applying, on a substrate, a composition for coating film formation which contains a polymer having silazane bonds, thereby forming a film,
irradiating the film with light having a maximum peak wavelength of 160-179 nm, and
successively irradiating the film with light having a maximum wavelength longer by 10-70 nm than the maximum peak wavelength of the light with which the film has been irradiated;
and a dense silicic film formed by the method.
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Inventors:
OZAKI YUKI (JP)
SAKURAI TAKAAKI (JP)
KOBAYASHI MASAKAZU (JP)
SAKURAI TAKAAKI (JP)
KOBAYASHI MASAKAZU (JP)
Application Number:
PCT/JP2013/077487
Publication Date:
April 17, 2014
Filing Date:
October 09, 2013
Export Citation:
Assignee:
AZ ELECTRONIC MATERIALS MFG JAPAN KK (JP)
International Classes:
B05D7/24; B05D3/06; B32B9/00; C01B21/068; C08J7/00; C08J7/048
Domestic Patent References:
| WO2012026482A1 | 2012-03-01 | |||
| WO2011086839A1 | 2011-07-21 |
Foreign References:
| JP2009503157A | 2009-01-29 | |||
| JP2004155834A | 2004-06-03 | |||
| JPH10279362A | 1998-10-20 | |||
| JP2012056101A | 2012-03-22 | |||
| JP2013052561A | 2013-03-21 | |||
| JP2011146226A | 2011-07-28 | |||
| JP2009503157A | 2009-01-29 | |||
| JP2011143327A | 2011-07-28 |
Other References:
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 23, no. 2, 2010, pages 225 - 230
See also references of EP 2907587A4
See also references of EP 2907587A4
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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