Title:
METHOD FOR FORMING FILTERING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/217748
Kind Code:
A1
Abstract:
A method for forming a filtering device, comprising: (S101) forming a first layer, comprising providing a first substrate; forming a resonant device pre-processing layer, the resonant device pre-processing layer comprising a first side and a second side opposite the first side, the first substrate being located at the first side; (S103) forming a second layer, comprising providing a second substrate; forming a first passive device, the first passive device comprising a third side and a fourth side opposite the third side, the second substrate being located at the third side; (S105) connecting the first layer and the second layer, the first layer being located at the fourth side, and the second layer being located at the second side; (S107) removing the first substrate; and (S109) forming at least one first resonant device on the basis of the resonant device pre-processing layer. Integrating the resonant device and the passive device into a wafer to form a filtering device can optimize the passband width, allows for high out-of-band suppression, and reduces the occupied space of a radio-frequency front-end chip.
Inventors:
YU CHENGCHENG (CN)
CAO YANJIE (CN)
WANG WEI (CN)
CAO YANJIE (CN)
WANG WEI (CN)
Application Number:
PCT/CN2020/090947
Publication Date:
November 04, 2021
Filing Date:
May 19, 2020
Export Citation:
Assignee:
SHENZHEN SUNWAY COMMUNICATION CO LTD (CN)
International Classes:
H03H9/64; H03H9/54; H03H9/58
Foreign References:
| CN110676287A | 2020-01-10 | |||
| CN103560763A | 2014-02-05 | |||
| CN108696263A | 2018-10-23 | |||
| US20180069528A1 | 2018-03-08 |
Attorney, Agent or Firm:
BORSAM INTELLECTUAL PROPERTY LTD. (CN)
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