Title:
METHOD OF FORMING A PHOTOCATALYTIC FILM ON A TRANSPARENT ELECTRODE
Document Type and Number:
WIPO Patent Application WO/2011/132287
Kind Code:
A1
Abstract:
Disclosed is a method of forming a photocatalytic film capable of strengthening bonds between photocatalytic particles in the photocatalytic film, and between a transparent electrode and the photocatalytic particles of the photocatalytic film. A transparent electrode (3) comprises a transparent substrate (1) and a transparent conductive film (2) thereon. A metal oxide sol coating is applied electrostatically on the transparent conductive film (2), and a photocatalytic film is formed by low-temperature firing of the resulting coating. Before, after, or before and after the firing, the coating film or the photocatalytic film is irradiated with a laser.
Inventors:
SUGIYO TAKESHI (JP)
INOUE TETSUYA (JP)
INOUE TETSUYA (JP)
Application Number:
PCT/JP2010/057144
Publication Date:
October 27, 2011
Filing Date:
April 22, 2010
Export Citation:
Assignee:
HITACHI SHIPBUILDING ENG CO (JP)
SUGIYO TAKESHI (JP)
INOUE TETSUYA (JP)
SUGIYO TAKESHI (JP)
INOUE TETSUYA (JP)
International Classes:
C23C26/00; B01J35/02; H01L31/04; H01M14/00
Domestic Patent References:
| WO2004033756A1 | 2004-04-22 |
Foreign References:
| JP2006342055A | 2006-12-21 | |||
| JP2006093212A | 2006-04-06 | |||
| JP2007115513A | 2007-05-10 | |||
| JP2006004827A | 2006-01-05 |
Attorney, Agent or Firm:
HIBI, Norihiko et al. (JP)
Norihiko Hibi (JP)
Norihiko Hibi (JP)
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Claims: