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Patent Searching and Data


Title:
A METHOD OF LASER ETCHING A STRUCTURE BY FIRST RADIATING AREAS OF THE STRUCTURE FOR ALTERING THE CRYSTALLINITY
Document Type and Number:
WIPO Patent Application WO/2005/108000
Kind Code:
A1
Abstract:
An etching method (10) includes applying a first electromagnetic radiation (24) to an area (42) of structure (40), thereby altering a characteristic of the structure (40) in the area (42), and applying a second electromagnetic radiation (34) to the structure (40), the second electromagnetic radiation (34) configured to selectively ablate the structure (40) based on the characteristic, wherein the characteristic, in a preferred embodiment, is crystallinity.

Inventors:
NELSON CURT (US)
LONG GREG (US)
Application Number:
PCT/US2005/013180
Publication Date:
November 17, 2005
Filing Date:
April 18, 2005
Export Citation:
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Assignee:
HEWLETT PACKARD DEVELOPMENT CO (US)
NELSON CURT (US)
LONG GREG (US)
International Classes:
B01J19/12; B23K26/06; B23K26/40; B23K26/42; C23F4/00; H01L21/268; (IPC1-7): B23K26/40; B23K26/42; B23K26/06; B01J19/12; H01L21/268
Foreign References:
US4834834A1989-05-30
US5580473A1996-12-03
US5024724A1991-06-18
US4877939A1989-10-31
US4961052A1990-10-02
US20020017116A12002-02-14
EP1067593A22001-01-10
US6617541B12003-09-09
Attorney, Agent or Firm:
Coulman, Donald J. (Intellectual Property Administration P.O. Box 272400, Mail Stop 3, Fort Collins Colorado, US)
Powell, Stephen David (Morley House 26-30 Holborn Viaduct, London EC1A 2BP, GB)
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