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Patent Searching and Data


Title:
METHOD FOR MAINTAINING FLOOR COVERING LAYER AND POLISHING APPARATUS FOR USE IN SAID METHOD
Document Type and Number:
WIPO Patent Application WO/2007/049354
Kind Code:
A1
Abstract:
This invention provides a method for maintaining a floor covering layer that can simplify work for maintaining the covering properties of a covering layer. The method is a method for maintaining a floor covering layer for maintaining the covering properties of a covering layer (B) stacked on and covering a floor (A). In this method, a resin covering layer (B) having a thickness (T0) of 30 to 100 μm is stacked on a floor. The surface of the resin covering layer (B) is subjected to dry grinding using grinding pads (6, 7) provided with grinding faces (6a, 7a) moved along one direction without using any liquid. After the generated grinding dust is recovered, a resin covering layer stacking material (26) is coated onto the resin covering layer (B) to restore the thickness (T1) of the resin covering layer (B), which has been reduced by grinding, to a substantially original thickness (T0). This thickness restoration work is carried out in proper timing depending upon a deterioration in covering properties to maintain the covering properties of the covering layer (B).

Inventors:
FUJIMOTO TADAYOSHI (JP)
MORITA ISAO (JP)
NAMBA KATSUAKI (JP)
Application Number:
PCT/JP2005/019897
Publication Date:
May 03, 2007
Filing Date:
October 28, 2005
Export Citation:
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Assignee:
PENGUIN WAX CO LTD (JP)
FUJIMOTO TADAYOSHI (JP)
MORITA ISAO (JP)
NAMBA KATSUAKI (JP)
International Classes:
E04F15/12; B05D3/12; E04F21/00
Foreign References:
JP2004173806A2004-06-24
JP2005000872A2005-01-06
JPH0924006A1997-01-28
JP2003265384A2003-09-24
Other References:
See also references of EP 1942238A4
Attorney, Agent or Firm:
KITAMURA, Shuichiro (Nakanoshima 2-chome Kita-k, Osaka-shi Osaka 05, JP)
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