Title:
METHOD FOR MANUFACTURING ANISOTROPIC ELECTROCONDUCTIVE MATERIAL, AND METHOD FOR MANUFACTURING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2021/166999
Kind Code:
A1
Abstract:
The present invention provides a method for manufacturing an anisotropic electroconductive material that includes a specific anisotropic electroconductive layer formation step for forming, on a base, an anisotropic electroconductive layer that includes an organic insulator layer and a plurality of conductors that penetrate the organic insulator layer. As viewed from the direction of a normal to the film surface of the anisotropic electroconductive layer, an exposed part of each of the plurality of conductors on the surface of the anisotropic electroconductive layer on the side away from the base has a shape that fits within a circle having a diameter of 5 µm. The present invention also provides a method for manufacturing an element that includes said method for manufacturing an anisotropic electroconductive material.
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Inventors:
TAKAKUWA HIDEKI (JP)
SHIMADA KAZUTO (JP)
SAIE TOSHIYUKI (JP)
SATO NAOKI (JP)
SHIMADA KAZUTO (JP)
SAIE TOSHIYUKI (JP)
SATO NAOKI (JP)
Application Number:
PCT/JP2021/006110
Publication Date:
August 26, 2021
Filing Date:
February 18, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01B13/00; H01R11/01; H01R43/00
Foreign References:
| JPH03283375A | 1991-12-13 | |||
| JP2002260753A | 2002-09-13 | |||
| JPH07282878A | 1995-10-27 |
Attorney, Agent or Firm:
SIKS & CO. (JP)
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