Title:
METHOD FOR MANUFACTURING GALLIUM OXIDE FILM
Document Type and Number:
WIPO Patent Application WO/2020/129625
Kind Code:
A1
Abstract:
The present invention is a method for manufacturing a gallium oxide film, in which a mist produced by nebulization or droplet formation of a raw material liquid is conveyed using a carrier gas, and the mist is heated to undergo a thermal reaction so as to form a film on a substrate, wherein a raw material liquid that includes at least chloride ions and gallium ions is used as the raw material liquid, and the duration of heating of the mist is 0.002–6 seconds. Due to this configuration, provided is a method for manufacturing an α-gallium oxide film that achieves outstanding film formation speed at low cost.
Inventors:
WATABE TAKENORI (JP)
HASHIGAMI HIROSHI (JP)
HASHIGAMI HIROSHI (JP)
Application Number:
PCT/JP2019/047268
Publication Date:
June 25, 2020
Filing Date:
December 03, 2019
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C23C16/40; C23C16/448; H01L21/368; H01L21/365
Foreign References:
| JP2018070422A | 2018-05-10 | |||
| JP2013028480A | 2013-02-07 | |||
| JP2017088454A | 2017-05-25 | |||
| JP2017069424A | 2017-04-06 | |||
| JP2016157878A | 2016-09-01 | |||
| JP2016146442A | 2016-08-12 | |||
| JP2004224675A | 2004-08-12 | |||
| JP2010510165A | 2010-04-02 | |||
| JPH01257337A | 1989-10-13 | |||
| JP2005307238A | 2005-11-04 | |||
| JP2012046772A | 2012-03-08 | |||
| JP5397794B1 | 2014-01-22 | |||
| JP2014063973A | 2014-04-10 |
Other References:
See also references of EP 3901995A4
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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