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Title:
METHOD FOR MANUFACTURING PASSIVATION FILM
Document Type and Number:
WIPO Patent Application WO/2021/124810
Kind Code:
A1
Abstract:
Provided is a method which is for manufacturing a passivation film, and by which a passivation film having a low concentration of oxygen atoms can be manufactured with excellent reproducibility. A passivation film is manufactured by a method comprising a passivation step for treating a substrate having at least one among germanium and molybdenum on the surface thereof with passivation gas containing hydrogen sulfide and an oxygen-containing compound, which is a compound having an oxygen atom in a molecule, to form a passivation film containing a sulfur atom on the surface of the substrate. The concentration of the oxygen-containing compound in the passivation gas is 0.001-75 ppm by mole (exclusive of 75).

Inventors:
TANIMOTO YOSUKE (JP)
Application Number:
PCT/JP2020/043674
Publication Date:
June 24, 2021
Filing Date:
November 24, 2020
Export Citation:
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Assignee:
SHOWA DENKO KK (JP)
International Classes:
H01L21/312
Domestic Patent References:
WO2017221594A12017-12-28
Foreign References:
JP2007123895A2007-05-17
JPH0769782A1995-03-14
JPH02141406A1990-05-30
Other References:
See also references of EP 4080549A4
Attorney, Agent or Firm:
TANAKA Hidetetsu et al. (JP)
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