Title:
METHOD FOR MANUFACTURING SALT-FREE POLYSILOXANE
Document Type and Number:
WIPO Patent Application WO/2019/244883
Kind Code:
A1
Abstract:
[Problem] To provide a method for manufacturing polysiloxane in which the concentration of salts or the like is reduced by removing the salts contained in the polysiloxane as impurities by using activated carbon. The present invention is applicable to semiconductor-related fields.
[Solution] The present invention provides a method for manufacturing salt-free polysiloxane, the method including: a step (1) for bringing polysiloxane into contact with activated carbon in an organic solvent; and a step (2) for subsequently separating the polysiloxane. The polysiloxane can be employed at a proportion of 20-90% by mass on the basis of the total mass of the polysiloxane and the organic solvent, and the activated carbon can be employed at a proportion of 3-100% by mass on the basis of the mass of the polysiloxane. The contact temperature with respect to the activated carbon in the step (1) can be adjusted in a range of 5-50ºC. Regarding the organic solvent, a non-polar organic solvent can be employed, and examples thereof among aromatic hydrocarbons include benzene, toluene, xylene, and mesitylene, and examples thereof among aliphatic hydrocarbons include octane, nonane, decane, undecane, and dodecane. The activated carbon can have an average particle size of 3-200 micrometers.
Inventors:
AOBA KAZUHIRO (JP)
Application Number:
PCT/JP2019/024086
Publication Date:
December 26, 2019
Filing Date:
June 18, 2019
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08G77/34
Domestic Patent References:
| WO2014157682A1 | 2014-10-02 | |||
| WO2014157681A1 | 2014-10-02 |
Foreign References:
| JP2013014764A | 2013-01-24 | |||
| JP2010516881A | 2010-05-20 | |||
| JP2009510243A | 2009-03-12 | |||
| JP2003327699A | 2003-11-19 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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